| سال | هفته | ID | Title | ApplNo | IPC | Applicant | Subgroup | زیر گروه | رشته | شرح | Description |
|---|
2026 | 02 | WO/2025/248092 | POLYPHENOLETHERS AS MOLECULAR GLASS MATERIAL FOR MOLECULAR RESISTS | EP2025/064996 | G03F 7/004 | MERCK PATENT GMBH | PHYSICS | فیزیک | ابزارها | 2026 | 02 | WO/2026/007168 | NANOIMPRINT MOLD AND NANOIMPRINT METHODS | CN2024/105481 | G03F 7/00 | SUZHOU NDNANO MICRO AND NANO CO., LTD | PHYSICS | فیزیک | ابزارها | 2026 | 02 | WO/2026/007452 | PREPARATION METHOD FOR PREPARING MICRO-NANO STRUCTURE PATTERN ON SURFACE OF 3D CAMBERED-SURFACE SUBSTRATE | CN2025/081755 | G03F 7/00 | SUZHOU GUANGDUO MICRO NANO DEVICES CO., LTD | PHYSICS | فیزیک | ابزارها | 2026 | 02 | WO/2026/007453 | COMPOSITE STRUCTURE TEMPLATE FOR NANOIMPRINT LITHOGRAPHY AND FABRICATION METHOD THEREFOR | CN2025/081759 | G03F 7/00 | SUZHOU GUANGDUO MICRO NANO DEVICES CO., LTD | PHYSICS | فیزیک | ابزارها | 2026 | 02 | WO/2026/007724 | DRY FILM RESIST, AND PREPARATION METHOD THEREFOR AND USE THEREOF | CN2025/102676 | G03F 7/004 | HUNAN INITIAL NEW MATERIALS CO., LTD. | PHYSICS | فیزیک | ابزارها | 2026 | 02 | WO/2026/008137 | METHOD FOR PRODUCING A SURFACE PROFILE ON A SUBSTRATE, SYSTEM FOR A METHOD OF THIS TYPE AND CONTROL PROGRAM | EP2024/068709 | G03F 7/00 | EV GROUP E. THALLNER GMBH | PHYSICS | فیزیک | ابزارها | 2026 | 02 | WO/2026/008213 | GRAPH NEURAL NETWORKS FOR EXPLOITING SPATIAL AND SEMANTIC RELATIONS IN METROLOGY DATA | EP2025/064485 | G03F 7/00 | ASML NETHERLANDS B.V. | PHYSICS | فیزیک | ابزارها | 2026 | 02 | WO/2026/008215 | SUBSTRATE SUPPORT ASSEMBLY | EP2025/064599 | G03F 7/00 | ASML NETHERLANDS B.V. | PHYSICS | فیزیک | ابزارها | 2026 | 02 | WO/2026/008218 | METHOD OF CONTROLLING EXPOSURE APPARATUS | EP2025/064810 | G03F 7/00 | ASML NETHERLANDS B.V. | PHYSICS | فیزیک | ابزارها | 2026 | 02 | WO/2026/008222 | SPECTRAL FILTER MEMBRANE | EP2025/065203 | G03F 7/20 | ASML NETHERLANDS B.V. | PHYSICS | فیزیک | ابزارها | 2026 | 02 | WO/2026/008228 | SYSTEMS AND METHODS FOR INSPECTING AND STORING RETICLES | EP2025/065295 | G03F 1/84 | ASML NETHERLANDS B.V. | PHYSICS | فیزیک | ابزارها | 2026 | 02 | WO/2026/008237 | SYSTEMS AND METHODS FOR RETICLE TRANSMISSION MEASUREMENTS IN A LITHOGRAPHIC SYSTEM | EP2025/065527 | G03F 1/84 | ASML NETHERLANDS B.V. | PHYSICS | فیزیک | ابزارها | 2026 | 02 | WO/2026/008243 | EXPOSURE APPARATUS | EP2025/065720 | G03F 7/00 | ASML NETHERLANDS B.V. | PHYSICS | فیزیک | ابزارها | 2026 | 02 | WO/2026/008250 | DUAL COMB RADIATION SOURCE AND HETERODYNE DETECTION FOR ALIGNMENT METROLOGY | EP2025/065955 | G03F 7/20 | ASML NETHERLANDS B.V. | PHYSICS | فیزیک | ابزارها | 2026 | 02 | WO/2026/008427 | BITMAP SKEW COMPENSATION | EP2025/067951 | G03F 7/00 | MYCRONIC AB | PHYSICS | فیزیک | ابزارها | 2026 | 02 | WO/2026/008524 | OPTICAL ELEMENT INCLUDING AT LEAST ONE SMOOTHING LAYER AND OPTICAL ARRANGEMENT | EP2025/068436 | G03F 7/00 | CARL ZEISS SMT GMBH | PHYSICS | فیزیک | ابزارها | 2026 | 02 | WO/2026/009614 | REFLECTIVE MASK BLANK AND METHOD FOR MANUFACTURING REFLECTIVE MASK | JP2025/019918 | G03F 1/24 | AGC INC. | PHYSICS | فیزیک | ابزارها | 2026 | 02 | WO/2026/009829 | RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, FLUORINE-CONTAINING POLYMER COMPOUND, AND COMPOUND | JP2025/023199 | G03F 7/004 | TOKYO OHKA KOGYO CO., LTD. | PHYSICS | فیزیک | ابزارها | 2026 | 02 | WO/2026/009845 | NEGATIVE PHOTOSENSITIVE ADHESIVE COMPOSITION, PHOTOSENSITIVE ADHESIVE DRY FILM, PATTERN FORMATION METHOD, AND METHOD FOR PRODUCING LAMINATE | JP2025/023303 | G03F 7/004 | TOKYO OHKA KOGYO CO., LTD. | PHYSICS | فیزیک | ابزارها | 2026 | 02 | WO/2026/009861 | COMPOSITION FOR SEMICONDUCTOR MANUFACTURING AND FILM FORMING METHOD | JP2025/023427 | G03F 7/004 | MITSUBISHI GAS CHEMICAL COMPANY, INC. | PHYSICS | فیزیک | ابزارها | 2026 | 02 | WO/2026/009862 | REMOVAL METHOD, SOLUTION COMPOSITION, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE | JP2025/023428 | G03F 7/32 | MITSUBISHI GAS CHEMICAL COMPANY, INC. | PHYSICS | فیزیک | ابزارها |